|
| Atmel Announces High-Voltage CMOS Foundry Process with High-Density EEPROM | | | |
San Jose, CA - Atmel® Corporation (Nasdaq: ATML), a global leader in the development and fabrication of advanced semiconductor solutions, announced today the release of its AT35700 high-voltage process technology with double-poly, high-density EEPROM for IC foundry customers. This 0.35um technology has LDMOS transistors capable of 17V and 40V operation and has a 5.0V low-leakage CMOS core. The low-leakage CMOS has been engineered to minimize sub-threshold leakage currents making this technology ideal for portable electronic devices. Isolated NMOS and LDMOS transistors are included to minimize circuit noise. A large selection of on-chip analog resistors and capacitors are included to reduce off-chip component requirements. The technology supports placement of ESD and I/O transistors under the bond pads, thus minimizing the die size.
Included is Atmel’s reliable double-poly, high-density memory cell. The cell can be used to create parallel, serial, or pseudo Flash memory designs. Having embedded EEPROM provides large data storage capability as required in monitor and control applications and eliminates the need for additional memory chips.
This high-voltage process technology is ideal for mixed-signal, power management, motor and motion control, and automotive monitoring and control applications. These applications can be greatly expanded with design solutions enhanced with Atmel's industry standard, workhorse AVR® microcontroller line.
Multi-project Wafers (MPWs) - Atmel offers frequent multi-project wafer (MPW) runs that provide an economical means for customers to debug and prototype devices without purchasing an entire mask set. Multiple customers share the same reticle and wafer-run, thereby reducing the cost of entry. Prices for MPW runs are dependent on the die size.
Design Kits – Atmel offers a wide range of mature libraries that support accurate mixed-signal simulation within the Cadence® Design Environment.
Atmel’s 35700 0.35um high-voltage CMOS process is available now.
Foundry and Support Services - Atmel provides IC foundry technologies with geometries ranging from 0.8um to 0.13um, along with fully characterized design kits and a large intellectual property library. Atmel offers additional support services including design, advanced packaging, testing, characterization, and qualification.
Footnote
CMOS = Complimentary Metal Oxide Semiconductor
EEPROM = Electrically Erasable Programmable Read Only Memory
ESD = Electro Static Discharge
NMOS = N-Channel Metal Oxide Semiconductor
LDMOS = Laterally Diffused Metal Oxide Semiconductor
I/O = Input Output |
Jueves, 08 Junio, 2006 - 05:40 | |
|
| Atmel Announces High-Voltage CMOS Foundry Process with High-Density EEPROM | Entrar/Crear una cuenta | 0 Comentarios |
|
| Los comentarios son propiedad de sus respectivos autores.
No somos responsables de su contenido.
No se permitirán los comentarios que :
- puedan resultar ofensivos o injuriosos
- incluyan insultos, alusiones sexuales innecesarias y palabras soeces o vulgares
- apoyen la pedofilia, el terrorismo o la xenofobia |
|
| Boletines de correo |
|---|
 |
| Alguien dijo ... |
|---|
Es más frecuente que la confianza sea generada por la ignorancia que por el conocimiento: son los que conocen poco y no los que conocen mucho, los que afirman tan positivamente que este o aquel problema nunca será solucionado por la ciencia.
Charles Darwin (1809-1892). |
| Electrónica Fácil en tu móvil |
|---|
 |
|
