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Freescale and ASM International N.V. Announce Cooperation on Epitaxy for Advanced CMOS Transistor Technologies

AUSTIN, Texas, and PHOENIX, Arizona — Freescale Semiconductor (NYSE:FSL, FSL.B) and ASM International N.V. (Nasdaq:ASMI; Euronext Amsterdam:ASM) have agreed to continue their collaboration on process technologies for the production of advanced CMOS integrated circuits.

Freescale and ASMI, which have collaborated in the past, are developing selective epitaxy for CMOS transistor structures. Selective epitaxial growth induces strain in the channel region of the transistor. Strained Si increases carrier mobility, resulting in increased current output. The companies are investigating methods specifically tuned to optimize the performance of CMOS devices in conjunction with the use of both bulk and silicon-on-insulator wafers.

Process development takes place on ASM Epsilon systems at ASM’s Phoenix development laboratory and Freescale’s Austin facilities. The companies will discuss so-called “recessed source and drain” integration into thin-body SOI wafers in a paper to be presented at the VLSI conference in Kyoto, Japan, June 14-16.

“This agreement is a highlight of a long and fruitful relationship between Freescale and ASMI,” says Arthur del Prado, president and CEO of ASMI. “Almost from the beginning of the introduction of ASM’s unique approach in epitaxy with the single-wafer Epsilon reactor, Freescale has readily applied the technology to manufacturing Si bipolar and the much more complex SiGe heterojunctions devices. Thanks to the efforts developed more recently in the CMOS technology, remarkable integration results have been achieved with strained Si using very advanced processing technologies. This extended allianceunderlines the desire to continue this work in an even more dedicated way, which will be of great benefit to Freescale and its partners.”

The collaboration is part of Freescale’s ongoing commitment to develop technologies that enable customers to offer superior products at competitive prices.

“Freescale is recognized as a leader in advanced logic and communication devices in part because we work with the leading suppliers,” said Joe Mogab, senior technical fellow and director of Freescale’s Advanced Products Research and Development Laboratory. “The ASM and Freescale epitaxy program is expected to deliver increased process capabilities and advantageous manufacturing efficiency to next-generation CMOS transistors.”

Jueves, 16 Junio, 2005 - 07:28
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